AMC Filters

A special challenge in highly clean production environments (i.e. semiconductor manufacturing)  is removal of airborne molecular contamination (AMC), such as acids, bases, condensables and dopants from the process air. These can lead i.e. to undesired chemical reactions on the wafer surface and pro¬¨cess equipment. Being one of the pioneers in the development of AMC filters, Exyte Technology offers a comprehensive variety of different filtration products for various application areas, such as make-up air (MAU) or return air filters filters for cleanroom ceilings or for tool and process protection.

The products are engineered in our in-house technology center and are qualified and optimized in all relevant aspects such as filter capacity (= max lifetime), highest removal efficiency (= max process protection), lowest pressure drop (= energy saving), lowest outgassing and particle development. This is accompanied by complementary services such as application consulting, on-site measurements, rest capacity analyses, etc.

We look forward helping you finding the right solution for your special requirements!

Flat filters containing activated or impregnated carbon media.

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Flat filters containing ion-exchange media for highly effective removal of acids or bases.

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Flat combination filters containing different filter media in one housing for removal of multiple contaminant categories.

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Flat filter containing a special activated carbon medium, which allows regenerating the product, thus enabling several usage cycles.

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V-cell with polystyrene frame containing activated or impregnated carbon media.

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V-cell with polystyrene frame containing ion-exchange media for highly effective removal of acids or bases.

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