超纯水处理

To generate smaller structures with the same wave length the optical density of the medium between objective and wafer can be changed using water. As the optical density is extremly sensitive to chemical impurities as well as changes in temperature, the used  Ultra-Pure-Water (UPW) requires an extremely high temperature stability to achieve stable imaging qualities.
Together with the customer Exyte Technology developed systems and solutions to generate UPW and condition it with a precision of ± 0,25 mK. Those products are the precondition for the sucessful application of immersion technology in lithograpic processes.